PM216L vacuum plasma processor
PM216L
Features: High precision, fast response, good handling and compatibility, perfect functions and professional technical support.

Uses: Suitable for camera and industry, mobile phone manufacturing, semiconductor IC field, silicone, plastic, polymer field, automotive electronics industry, aviation industry, etc.
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Number Content Specification Parameters
1 Machine specifications 1450mm(W)×1720mm(H)×1150 mm(D)
2 Vacuum Chamber Specifications Imported aluminum 600(W)×600(H)×600(D)mm
3 Electrode Specifications 10-layer flat electrode plate(560(W)×500(D)mm)可定制
4 Control System Touch screen + PLC control
5 Vacuum measurement system Pirani resistance vacuum gauge
6 Gas Metering System Accurate mass flow controller MFC
7 Number of gas channels 2-5 working gases are optional: Ar2, N2, H2, CF4, O2
8 Plasma generator 500W&1KW plasma source, 40KHz (optional 13.56MHz)
9 Working gas 2 working gases are optional: Ar2, N2, H2, O2
Features: High precision, fast response, good handling and compatibility, perfect functions and professional technical support.

Uses: Suitable for camera and industry, mobile phone manufacturing, semiconductor IC field, silicone, plastic, polymer field, automotive electronics industry, aviation industry, etc.
1. Printed circuit board industry: surface activation of high-frequency boards, surface cleaning and desmearing of multi-layer boards, surface cleaning and desmearing of soft boards and soft-rigid boards, activation of soft boards before reinforcement.
2. Semiconductor IC field: COB, COG, COF, ACF process, used for wire bonding and cleaning before welding;
3. Silica gel, plastic, polymer field: surface roughening, etching, and activation of silica gel, plastic, and polymer .
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