Number | Content | Specification Parameters |
---|---|---|
1 | handle width | 100mm~600mm (can be customized) |
2 | vacuum chamber | 1200L (can be customized) |
3 | Power Systems | 2KW~10KW plasma source |
4 | Control System | Touch screen + PLC automatic control |
5 | intake system | Standard 2-way working gas, expandable to 5-way working gas (Ar2, N2, H2, CF4, O2) |
Model use: vacuum roll-to-roll equipment for processing PI polyimide film and FPC flexible circuit board; equipment features: mainly used for processing 100-600mm wide materials, materials are processed horizontally inside the vacuum chamber, loading and unloading Simple and can be used in etching process. The vacuum chamber is automatically switched on and off, one-button start and stop, and the operation is simple and convenient. ※The built-in tension control system in the vacuum chamber effectively protects the expansion and contraction of the material and makes the processing more stable; ※The high-performance plasma generator stimulates a more stable plasma; ※The special electrode structure is more suitable for plasma surface of wide double-sided materials Processing; ※ The use of water-cooled electrodes in the middle can truly achieve process temperature control and uniformity; ※ The unique curling design effectively solves the problem of rolling materials, and the pulling of materials is more convenient ; It is more convenient to roll up and down; ※ Frequency conversion is energy-saving, and the frequency of the frequency converter is automatically adjusted through the vacuum system to automatically adjust the speed of the vacuum pump to maintain the vacuum degree; |
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